AP-MALDI

CryLaS 355 nm and 213 nm pulsed lasers are alternatives to nitrogen and excimer lasers for use in atmospheric pressure matrix assisted laser desorption/ionization, which is used in the analysis of proteomics, polymers, antioxidants and pigments.

See Pulsed Lasers:   FQSS-213-Q series | FTSS-355-Q series

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Capillary Electrophoresis Laser-Induced Fluorescence (CE-LIF)

CryLaS 266 nm lasers with 2 mW average power are used in dynamic ligand exchange-affinity capillary electrophoresis. Fiber usage with CryLaS 266 nm lasers is increasing with the improved design of robust fibers able to withstand deep uv wavelength exposure. CryLas 266 nm Q series pulsed lasers are used to establish a deep UV-LIF detector for sensitive detection of EPO and an immuno-extraction approach for convenient extraction of EPO.

See Pulsed Lasers:  FQSS-266-Q series

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Improvement of optical damage in specialty fiber at 266 nm wavelength

Immuno-magnetic beads-based extraction-capillary zone electrophoresis-deep UV laser-induced fluorescence analysis of erythropoietin

Fluorescence Microscopy

CryLaS 355 nm pulsed lasers are found in time resolved lifetime fluorescence measurement applications, particularly neurologic studies of various human tissues. Both CryLaS FTSS-355-Q and FDSS-532-Q lasers are used as an excitation source in fluorescence lifetime imaging (FLIM) thereby providing access to detailed tissue morphology and local biochemistry.

See Pulsed Lasers:  FTSS-355-Q2  | FTSS-355-50 | FDSS-532-Q series

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Multimodal optical coherence tomography and fluorescence lifetime imaging with interleaved excitation sources for simultaneous endogenous and exogenous fluorescence

Laser Ablation

CryLas FDSS-532-Q series lasers at 60 µJ/pulse @ 200 Hz and FTSS-355-Q lasers are used for inflicting localized damage to a diffraction limited spot in intracellular structures for precise cutting and wounding.  CryLaS 1064 nm pulsed lasers are used in fluorescent guided laser ablation for removal of cancer in soft tissue sarcoma. The FTSS-355-15 µJ @ 2.5 kHz laser is used for irradiation and subsequent laser ablation of nuclei or chromosomes for biological research. The FDSS-532-Q3 laser is used for Laser Axotomy systems to study Axon Regeneration in C. elegans.  A CryLaS FDSS-532-Q laser is used in the transfer of molecules, such as chemical drugs and proteins, into cells.

See Pulsed Lasers:   FTSS-355-Q series | FDSS-532-Q series | DSS-1064-Q series series

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A Flourescence-Guided Laser Ablation System for Removal of Residual Cancer in a Mouse Model of Soft Tissue Sarcoma

Aster migration determines the length scale of nuclear separation in the Drosophila syncytial embryo

Constructing a Low-budget Laser Axotomy System to Study Axon Regeneration in C.elegans

A novel low-power laser-mediated transfer of foreign molecules into cells

Laser Capture Micro-dissection

CryLaS 355 nm pulsed lasers are useful in the performance of Laser Capture Microdissection (LCM) where laser wounding and cutting of large biologic samples is required. Laser capture microdissection facilitates the isolation of individual cells from tissue sections. When combined with RNA amplification techniques, it is an extremely powerful tool for examining genome-wide expression profiles in specific cell types.

See Pulsed Lasers:  FTSS-355-Q4 | FTSS-355-50 | FTSS-355-300 | eMOPA 355-100 | MOPA 355-200

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Laser capture microdissection in Ectocarpus siliculosus: the pathway to cell-specific transcriptomics in brown algae

Laser Induced Breakdown Spectroscopy (LIBS)

CryLaS 266 nm pulsed lasers up to 200 µJ energy are used for Laser Induced Breakdown Spectroscopy (LIBS) evaluation of glass and other transparent materials across a variety of applications, such as forensics.

CryLaS 1064 nm pulsed lasers are used in the evaluation of scrap metals, paints chips and other related materials found in the recycling industry. CryLaS DSS-1064-3000 at 2 mJ/pulse is used for micro structuring of thin indium tin oxide layers on glass substrates under LIBS process controls for use in organic solar cells and liquid crystal displays.

See Pulsed Lasers:  FQSS-266-200 | DSS-1064-3000

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LIBS – A Versatile Tool for Spectroscopically Controlled Micro-Structuring of Thin Layers

Light Detection and Ranging (LIDAR)

CryLaS 532 nm pulsed lasers are used in LIDAR applications, for example remote sensing of various chemicals in the atmosphere and determining the turbidity of ocean water. The CryLaS FDSS-532-150 @ 150 µJ per pulse at 100 Hz repetition rate is used for fiber optic LIDAR for characterization of sea water and ice properties. The CryLaS FDSS-532-Q4 at 42 µJ per pulse is used for high altitude in situ cloud observations.

See Pulsed Lasers:  FDSS-532-1000 | FDSS-532-150 | FDSS-532-Q4

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An Underwater Fibers Optic LIDAR for the Characterization of Sea Water and Ice Properties

HoloGondel: in situ cloud observations on a cable car in the Swiss Alps using a holographic imager

Glass Marking

CryLaS high energy pulsed 213 nm, 266 nm and 355 nm lasers are used in ID marking on progressive optical lenses.

See Pulsed Lasers:  FQSS-213-50 | eMOPA 213-20 | FQSS-266-50 | FQSS-266-200 | MOPA 266-50 | FTSS-355-50 | FTSS-355-300 | MOPA 355-200

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Additive Manufacturing

CryLaS high energy pulsed 266 nm, 355 nm and cw 266 nm lasers are used in a variety of additive manufacturing applications.  The curing of a number of epoxies, resins and polymers are achieved on a sub-micron level.

See Pulsed Lasers:   FQSS-266-50 | FQSS-266-200 | MOPA 266-50 | FQCW-266-10 | FQCW-266-50 | FQCW-266-100 | FQCW-266-200 | FTSS-355-Q | FTSS-355-50 | FTSS-355-300 | MOPA 355-200

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Ophthalmic Surgery

CryLaS 213 nm pulsed lasers are used in a variety of ophthalmic surgery procedures.

See Pulsed Lasers:  FQSS-213-50

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Semiconductor Inspection

CryLaS 266 nm CW and 213 nm pulsed lasers are used in wafer, reticle inspection, automated optical inspection and laser direct imaging.

See Pulsed Lasers:  FQSS-266-Q series | FTSS-355-Q series

See CW Lasers: All CW Laser products

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Semiconductor Inspection using photoluminescence

CryLaS pulsed lasers in a wavelength range of 213 nm to 1064 nm are used in the characterization of LED wafers in manufacturing, e.g., Aluminum Nitride LED EPI wafer characterization. Our lasers allow for precise and repeatable photoluminescence metrology across the entire wavelength range, including high-Al content AlGaN alloys for GaN FET’s.  This laser is used in high-volume, production oriented photoluminescence mapping systems where 24/7 operation and control is necessary.

See Pulsed Lasers: All Pulsed Laser products

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Determination of triplet energies and decay times of light-emitting layers

Semiconductor Processing

CryLaS pulsed 266nm lasers are used in processing  semiconductor materials. The CryLaS FQSS-266-200 at 200 µJ and 800 µm beam diameter is used in solution growth of polycrystalline silicon on glass using Tin and Indium as solvents.

See Pulsed Lasers:    FQSS-266-200

CryLaS 1064 nm pulsed energy lasers are used for semiconductor display repair.

See Pulsed Lasers:   DSS-1064-Q series | DSS 1064-450

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Solution Growth of Polycrystalline Silicon on Glass using Tin and Indium as Solvents

Lens Metrology

CryLaS CW 266 nm lasers are used in the characterization of lenses.

See CW Lasers:  FQCW-266-50

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Mass Spectroscopy

CryLaS lasers are used as high energy sources in the ionization of chemical and biological samples that are evaluated in mass spectrometers. For example, CryLaS  pulsed 213 nm UV laser sources emit up to 50 µJ of energy per pulse at up to 2.5 kHz repetition rate for use in proteomics photodissociation.  CryLaS pulsed 266 nm lasers are used in gas chromatography resonance-enhance multiphoton ionization time-of-flight mass spectrometry (GC/REMPI-TOFMS) to analyze the polycyclic aromatic hydrocarbons (PAHs).

See Pulsed Lasers:  FQSS-213-Q series | FQSS-213-50 | eMOPA 213-20 | FQSS-266-Q series | FQSS-266-50

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The Application of Resonance-Enhanced Multiphoton Ionization Technique in Gas Chromatography Mass Spectrometry

Evaluation of the Performance of Small Diode Pumped UV Solid State (DPSS) Nd:YAG Lasers as New Radiation Sources for Atmospheric Pressure Laser Ionization Mass Spectrometry (APLI-MS)

Raman Spectroscopy and Photoluminescence

CryLaS 266nm continuous wave lasers up to 0.5 watt are used for deep UV Raman scattering  within semiconductor devices and photoluminescence in forensic samples. Deep UV Raman excitation with the CryLaS FQCW-266-10 in thin silicon oxide semiconductor films results in reduced penetration depth and successful collection of  one-phonon Raman spectrum. The CryLaS FQCW 266 series exhibits a compact, air cooled single frequency (< 300 kHz line width), long coherence length (1000m), and TEMoo output (M2< 1.3), making a low noise laser system useful for such applications.

See CW Lasers:    FQCW-266-10 | FQCW-266-50 | FQCW-266-100 | FQCW-266-200 | FQCW-266-500

SeePulsed Lasers:  FTSS-355-Q2 | FTSS-355-50

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Deep-ultraviolet Raman investigation of silicon oxide: thin film on silicon substrate versus bulk material

Determination of SP3 Fraction in ta-C Coating Using XPS and RAMAN Spectroscopy

Dual wavelength excitation for the time-resolved photoluminescence imaging of painted ancient Egyptian objects

Absorption Spectroscopy

CryLaS 532 nm Q series pulsed lasers are used in Transient Absorption Ultrasonic Microscopy (TAUM) to image micro vascular animal tissue samples. CryLaS 532 nm lasers at 1 mJ per pulse are used for photo acoustic imaging of biological samples.

See Pulsed Lasers:   FDSS-532-Q series | FDSS-532-1000

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Ultrahigh resolution photoacoustic microscopy via transient absorption

Photoacoustic elastic oscillation and chracterization

Rayleigh Scattering

CryLaS 266 nm continuous wave lasers up to 0.5 W are used in the identification of gas species for security purposes by investigating the absorption of laser energy and resulting scattering.

See CW Lasers:  FQCW-266-10 | FQCW-266-500

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